Gate structure for semiconductor device

ABSTRACT

A semiconductor device and method of fabricating thereof is described that includes a substrate having a fin with a top surface and a first and second lateral sidewall. A hard mask layer may be formed on the top surface of the fin (e.g., providing a dual-gate device). A gate dielectric layer and work function metal layer are formed on the first and second lateral sidewalls of the fin. A silicide layer is formed on the work function metal layer on the first and the second lateral sidewalls of the fin. The silicide layer may be a fully-silicided layer and may provide a stress to the channel region of the device disposed in the fin.

PRIORITY DATA

This application is a Continuation of U.S. Ser. No. 13/411,304 filedMar. 2, 2012, and entitled “GATE STRUCTURE FOR SEMICONDUCTOR DEVICE,”the entire disclosure of which is incorporated herein by reference.

BACKGROUND

The semiconductor integrated circuit (IC) industry has experienced rapidgrowth. Over the course of this growth, functional density of thedevices has generally increased by the device feature size or geometryhas decreased. This scaling down process generally provides benefits byincreasing production efficiency, lower costs, and/or improvingperformance. Such scaling down has also increased the complexities ofprocessing and manufacturing ICs and, for these advances to be realizedsimilar developments in IC fabrication are needed.

Likewise, the demand for increased performance and shrinking geometryfrom ICs has brought the introduction of multi-gate devices. Thesemulti-gate devices include multi-gate fin-type transistors, alsoreferred to as finFET devices, because the channel is formed on a “fin”that extends from the substrate. FinFET devices may allow for shrinkingthe gate width of device while providing a gate on the sides and/or topof the fin including the channel region.

Another manner improving the performance of a semiconductor device is toprovide stress on or strain to pertinent regions of the device.Manipulating the stress provided in a region is an effective way ofimproving the minority carrier mobility in a FET device. When stress isapplied to a channel of a semiconductor device, the mobilities of thecarriers can be affected and as such the transconductance and on-currentfor the device altered. For example, tensile stress may benefit an NFETdevice allowing increased mobility of the carriers (e.g., holes) throughthe channel region. Conversely, compressive stress may benefit a PFETdevice.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isemphasized that, in accordance with the standard practice in theindustry, various features are not drawn to scale. In fact, thedimensions of the various features may be arbitrarily increased orreduced for clarity of discussion.

FIG. 1 is a perspective view of an embodiment of a semiconductor deviceaccording to one or more aspects of the present disclosure.

FIG. 2 is a flow chart of an embodiment of a method of fabricating asemiconductor device according to one or more aspects of the presentdisclosure.

FIGS. 3-5 are cross-sectional views of an embodiment of a semiconductordevice according to the process steps of the method of FIG. 2.

FIGS. 6-11 are cross-sectional views of a first embodiment of thesemiconductor device of FIGS. 3-5 at subsequent stages of fabricationaccording the method of FIG. 2.

FIGS. 12-15 are cross-sectional views of a second embodiment of thesemiconductor device of FIGS. 3-5 at subsequent stages of fabricationaccording the method of FIG. 2.

FIGS. 16-19 are cross-sectional views of a third embodiment of thesemiconductor device of FIGS. 3-5 at subsequent stages of fabricationaccording the method of FIG. 2.

DETAILED DESCRIPTION

It is to be understood that the following disclosure provides manydifferent embodiments, or examples, for implementing different featuresof the invention. Specific examples of components and arrangements aredescribed below to simplify the present disclosure. These are, ofcourse, merely examples and are not intended to be limiting. Moreover,the formation of a first feature over or on a second feature in thedescription that follows may include embodiments in which the first andsecond features are formed in direct contact, and may also includeembodiments in which additional features may be formed interposing thefirst and second features, such that the first and second features maynot be in direct contact. Various features may be arbitrarily drawn indifferent scales for simplicity and clarity. Additionally, the presentdisclosure may repeat reference numerals and/or letters in the variousexamples. This repetition is for the purpose of simplicity and clarityand does not in itself dictate a relationship between the variousembodiments. In it is understood that those skilled in the art will beable to devise various equivalents that, although not specificallydescribed herein embody the principles of the present disclosure.

Illustrated in FIG. 1 is a semiconductor device 100. The semiconductordevice 100 includes finFET type device(s). The semiconductor device 100may be an n-type finFET or a p-type finFET. The semiconductor device 100may be included in an IC such as a microprocessor, memory device, and/orother IC. The device 100 includes a substrate 102, a plurality of fins104, a plurality of isolation structures 106, and a gate structure 108disposed on each of the fins 104. Each of the plurality of fins 104include a source/drain region denoted 110 where a source or drainfeature is formed in, on, and/or surrounding the fin 104. A channelregion of the fin 104 underlies the gate structure 108 and is denoted112.

The substrate 102 may be a silicon substrate. Alternatively, thesubstrate 102 may comprise another elementary semiconductor, such asgermanium; a compound semiconductor including silicon carbide, galliumarsenic, gallium phosphide, indium phosphide, indium arsenide, and/orindium antimonide; an alloy semiconductor including SiGe, GaAsP, AlInAs,AlGaAs, GaInAs, GaInP, and/or GaInAsP; or combinations thereof. In yetanother alternative, the substrate 102 is a semiconductor on insulator(SOI) substrate.

The isolation structures 106 may be formed of silicon oxide, siliconnitride, silicon oxynitride, fluoride-doped silicate glass (FSG), alow-k dielectric material, and/or other suitable insulating material.The isolation structures 106 may be shallow trench isolation (STI)features. In an embodiment, the isolation structures are STI featuresand are formed by etching trenches in the substrate 102. The trenchesmay then be filled with isolating material, followed by a chemicalmechanical polish (CMP). Other fabrication techniques for the isolationstructures 106 and/or the fin structure 104 are possible. The isolationstructures 106 may include a multi-layer structure, for example, havingone or more liner layers.

The fin structures 104 may provide an active region where one or moredevices are formed. In an embodiment, a channel of a transistor deviceis formed in the fin 104. The fin 104 may comprise silicon or anotherelementary semiconductor, such as germanium; a compound semiconductorincluding silicon carbide, gallium arsenic, gallium phosphide, indiumphosphide, indium arsenide, and/or indium antimonide; an alloysemiconductor including SiGe, GaAsP, AlInAs, AlGaAs, GaInAs, GaInP,and/or GaInAsP; or combinations thereof. The fins 104 may be fabricatedusing suitable processes including photolithography and etch processes.The photolithography process may include forming a photoresist layer(resist) overlying the substrate (e.g., on a silicon layer), exposingthe resist to a pattern, performing post-exposure bake processes, anddeveloping the resist to form a masking element including the resist.The masking element may then be used to protect regions of the substratewhile an etch process forms a recesses into the silicon layer, leavingan extending fin. The recesses may be etched using reactive ion etch(RIE) and/or other suitable processes. Numerous other embodiments ofmethods to form the fins 104 on the substrate 102 may be suitable.

In an embodiment, the fins 104 are approximately 10 nanometer (nm) wideand between approximately 15 nm and 40 nm high (as measured from heightof the fin above the isolation region 106). However, it should beunderstood that other dimensions may be used for the fins 104. The fins104 may be doped using n-type and/or p-type dopants.

The gate structure 108 may includes a gate dielectric layer, a workfunction layer, and/or one or more additional layers. In an embodiment,the gate structure 108 includes a silicide layer such as described inthe embodiments below. The silicide layer may overlie the gatedielectric layer and/or the work function layer.

In an embodiment, the semiconductor device 100 is provided duringfabrication and the gate structure 108 is a sacrificial gate structuresuch as formed in a replacement gate process used to form a metal gatestructure. In an embodiment, the gate structure 108 includespolysilicon. In another embodiment, the gate structure 108 includes ametal gate structure.

A gate dielectric layer of the gate structure 108 may include silicondioxide. The silicon oxide may be formed by suitable oxidation and/ordeposition methods. Alternatively, the gate dielectric layer of the gatestructure 108 may include a high-k dielectric layer such as hafniumoxide (HfO₂). Alternatively, the high-k dielectric layer may optionallyinclude other high-k dielectrics, such as TiO₂, HfZrO, Ta₂O₃, HfSiO₄,ZrO₂, ZrSiO₂, combinations thereof, or other suitable material. Thehigh-k dielectric layer may be formed by atomic layer deposition (ALD)and/or other suitable methods.

In an embodiment, the gate structure 108 may be a metal gate structure.The metal gate structure may include interfacial layer(s), gatedielectric layer(s), work function layer(s), silicide layers asdescribed below, fill metal layer(s), and/or other suitable materialsfor a metal gate structure. In other embodiments, the metal gatestructure 108 may further include capping layers, etch stop layers,and/or other suitable materials. The interfacial layer may include adielectric material such as silicon oxide layer (SiO₂) or siliconoxynitride (SiON). The interfacial dielectric layer may be formed bychemical oxidation, thermal oxidation, atomic layer deposition (ALD),CVD, and/or other suitable dielectric.

Exemplary p-type work function metals that may be included in the gatestructure 108 include TiN, TaN, Ru, Mo, Al, WN, ZrSi₂, MoSi₂, TaSi₂,NiSi₂, WN, other suitable p-type work function materials, orcombinations thereof. Exemplary n-type work function metals that may beincluded in the gate structure 108 include Ti, Ag, TaAl, TaAlC, TiAlN,TaC, TaCN, TaSiN, Mn, Zr, other suitable n-type work function materials,or combinations thereof. A work function value is associated with thematerial composition of the work function layer, and thus, the materialof the first work function layer is chosen to tune its work functionvalue so that a desired threshold voltage Vt is achieved in the devicethat is to be formed in the respective region. The work functionlayer(s) may be deposited by CVD, PVD, and/or other suitable process.The fill metal layer may include Al, W, or Cu and/or other suitablematerials. The fill metal may be formed by CVD, PVD, plating, and/orother suitable processes. The fill metal may be deposited over the workfunction metal layer(s), and thereby filling in the remaining portion ofthe trenches or openings formed by the removal of the dummy gatestructure. The silicide layer may interpose the work function layer andthe fill metal. The silicide layer may be substantially similar to thoselayers described below, for example, silicide layer 802, silicide layer902, silicide layer 1402, and/or silicide layer 1702, described belowwith reference to FIGS. 8, 9, 14, and 17 respectively.

The semiconductor device 100 may include other layers and/or featuresnot specifically illustrated including additional source/drain regions,interlayer dielectric (ILD) layers, contacts, interconnects, and/orother suitable features.

The semiconductor device 100 may benefit in performance from a stressprovided on and in the fins 104 in the channel region 112. In anembodiment, a tensile strain may be generated. In another embodiment, acompressive strain may be generated. The strain may be obtained usingthe method 200, described below with reference to FIG. 2. In anembodiment, the stress is provided to the channel through the placementof a fully silicided layer in the gate structure provided on the channelregion. Description of the stress provided by on fin is also describedin application Ser. No. 13/243,723, filed on Sep. 23, 2011, which ishereby incorporated by reference in its entirety.

Referring now to FIG. 2, illustrated is flow chart of a method 200 ofsemiconductor fabrication according to one or more aspects of thepresent disclosure. The method 200 may be implemented to increase astress or stain provided in one or more regions of a semiconductordevice such as a field effect transistor (FET). In an embodiment, themethod 200 may be implemented to form a multi-gate fin-type transistoror finFET device. In an embodiment, the method 200 may be implemented toform a dual-gate finFET device. However, one may recognize other devicetypes that may benefit from the present method. FIGS. 3-19 arecross-sectional views of embodiments of a semiconductor devicefabricated according to steps the method 200 of FIG. 2. It should beunderstood that FIGS. 3-19 and the devices illustrated arerepresentative only and not intended to be limiting.

It should be further understood that the method 200 includes stepshaving features of a complementary metal-oxide-semiconductor (CMOS)technology process flow and thus, are only described briefly herein.Additional steps may be performed before, after and/or during the method200. Similarly, one may recognize other portions of a device that maybenefit from the methods described herein. It is also understood thatparts of the semiconductor device 300 may be fabricated by CMOStechnology and thus, some processes are only described briefly herein.Further, the semiconductor device illustrated may include various otherdevices and features, such as additional transistors, bipolar junctiontransistors, resistors, capacitors, diodes, fuses, etc., but issimplified for a better understanding of the inventive concepts of thepresent disclosure. The semiconductor devices described herein mayinclude a plurality of devices interconnected.

The method 200 begins at block 202 where a semiconductor substrate isprovided. The semiconductor substrate may be substantially similar to asdiscussed above with reference to the semiconductor substrate 102 of thesemiconductor device 100, described with reference to FIG. 1. In anembodiment, the semiconductor substrate includes a plurality of finsextending from the substrate.

Referring to the example of FIG. 3, a semiconductor device 300 includesa substrate 102 having a plurality of fins 104. Isolation structures(e.g., STI features) 106 interpose the fins 104. The semiconductordevice 300 may be substantially similar to the semiconductor device 100,described above with reference to FIG. 1.

A hard mask layer 302 overlies the top surface of the fin 104. The hardmask layer 302 may provide for a dual-gate device to be formed on thefin 104 (e.g., the gate structure 108 interfaces the channel region ofthe fin 104 at the lateral sides of the fin 104, and not the top surfaceproviding a dual-gate (as opposed to a tri-gate) transistor). The hardmask layer 302 may include silicon nitride or other suitable hard maskmaterial.

The method 200 then proceeds to block 204 where gate layers are formedon the substrate. In an embodiment, the gate layers are formed on and/oraround a fin extending from the substrate. The gate layers may include aplurality of layers such as interfacial layers, gate dielectric layers,work function layers, capping layers, and/or other suitable layers.

Referring to the example of FIG. 4, a gate dielectric layer 402 and awork function metal layer 404 are disposed on the substrate 102.Specifically, a gate dielectric layer 402 and a work function metallayer 404 are disposed on the fin 104. The gate dielectric layer 402 andthe work function metal layer 404 may be subsequently patterned (asdiscussed below) to be included in gate structure such as the gatestructure 108, described above with reference to FIG. 1.

The gate dielectric layer 402 may include silicon dioxide. The siliconoxide may be formed by suitable oxidation and/or deposition methods.Alternatively, the gate dielectric layer 402 may include a high-kdielectric layer such as hafnium oxide (HfO₂). Alternatively, the high-kdielectric layer may optionally include other high-k dielectrics, suchas TiO₂, HfZrO, Ta₂O₃, HfSiO₄, ZrO₂, ZrSiO₂, combinations thereof, orother suitable material. The high-k dielectric layer may be formed byatomic layer deposition (ALD) and/or other suitable methods. Aninterfacial layer (e.g., silicon oxide) may underlie the gate dielectriclayer 402.

The work function metal layer 404 may be an n-type or p-type workfunction layer. Exemplary p-type work function metals that may beincluded in the work function metal layer 404 the gate structure 108include TiN, TaN, Ru, Mo, Al, WN, ZrSi₂, MoSi₂, TaSi₂, NiSi₂, WN, othersuitable p-type work function materials, or combinations thereof.Exemplary n-type work function metals that may be included in the workfunction metal layer 404 include Ti, Ag, TaAl, TaAlC, TiAlN, TaC, TaCN,TaSiN, Mn, Zr, other suitable n-type work function materials, orcombinations thereof. The work function layer 404 may include aplurality of layers. The work function layer(s) 404 may be deposited byCVD, PVD, and/or other suitable process.

The method 200 then proceeds to block 206 where a polysilicon layer isformed on the substrate. The polysilicon layer may be formed as part ofa gate structure overlying the fin. In an embodiment, the polysiliconlayer is formed on the gate layers, described above with reference toblock 204. The gate layers and the polysilicon layer may be patterned toprovide a gate structure such as the gate structure 108, described abovewith reference to FIG. 1. For example, the polysilicon layer may be asacrificial layer formed as part of a metal gate formation process(e.g., gate first or gate last replacement gate process). Thepolysilicon layer may be formed by suitable deposition processes suchas, for example, low-pressure chemical vapor deposition (LPCVD) andplasma-enhanced CVD (PECVD). Referring to the example of FIG. 5, apolysilicon layer 502 is formed on the gate layers 402/404.

The method 200 then proceeds to block 208 where additional fabricationprocesses are performed including patterning the gate structure andforming the source/drain regions of the device.

These fabrication processes may include MOS technology processing toform various features known in the art. For example, the method 200 mayinclude patterning the gate layers and/or polysilicon layer to form agate structure. The patterning may include photolithography, etching,and/or other suitable processes. A source/drain region(s) may also beformed adjacent the gate structure. In an embodiment, the source/drainregion(s) include an epitaxially grown region on and/or around the fin.Spacer elements may be formed abutting the sidewalls of the gatestructure. The spacer elements may include one or more layers. In anembodiment, the spacer elements define a source/drain extension region.The source/drain regions may be doped using a junction implant and/orin-situ doped during the epitaxial growth process. A silicide region maybe formed on the source/drain region. The silicide materials may includenickel silicide (NiSi), nickel-platinum silicide (NiPtSi),nickel-platinum-germanium silicide (NiPtGeSi), nickel-germanium silicide(NiGeSi), ytterbium silicide (YbSi), platinum silicide (PtSi), iridiumsilicide (IrSi), erbium silicide (ErSi), cobalt silicide (CoSi), othersuitable conductive materials, and/or combinations thereof. The silicidecontact features can be formed by a process that includes depositing ametal layer, annealing the metal layer such that the metal layer is ableto react with silicon to form silicide, and then removing thenon-reacted metal layer.

A contact etch stop layer (CESL) and inter-layer dielectric (ILD) maythen be formed on the gate structure and/or source/drain regions.Examples of materials that may be used to form CESL include siliconnitride, silicon oxide, silicon oxynitride, and/or other materials knownin the art. The CESL may be formed by PECVD process and/or othersuitable deposition or oxidation processes. The ILD layer may includedielectric materials such as, tetraethylorthosilicate (TEOS) oxide,un-doped silicon glass, or doped silicon oxide such asborophosphosilicate glass (BPSG), fused silica glass (FSG),phosphosilicate glass (PSG), boron doped silicon glass (BSG), and/orother suitable dielectric materials. The ILD layer may be deposited by aPECVD process or other suitable deposition technique. After itsformation, a chemical mechanical polishing (CMP) process may planarizethe ILD layer. In an embodiment, the CMP process exposes a top surfaceof the polysilicon layer, described above in block 206.

The method 200 then proceeds to block 210 where a target layer(s) isprepared on the substrate. The target layer includes silicon. The targetlayer is a layer which is to be silicided, as described below withreference to block 212. The target layer is formed on the channel regionof the device, such that the siliciding of the target layer provides asilicide layer (e.g., fully silicided layer) that can induce channelstrain in the device. The target layer may be included in a gatestructure, such as, for example, the gate structure 108 described abovewith reference to FIG. 1.

In an embodiment, the target layer includes the polysilicon layerdescribed above with reference to block 206, or portion thereof. In anembodiment, a layer including silicon is deposited onto the substrate.Various embodiments of forming a target layer are discussed below withreference to FIGS. 6-7, FIGS. 12-13, and FIG. 16 respectively. However,one of ordinary skill in the art would recognize other embodimentswithin the scope of the present disclosure.

In an embodiment, the target layer is prepared by removing thepolysilicon layer, described above with reference to block 206, andforming a layer including silicon on the substrate to provide the targetlayer. Using FIGS. 6-7 as exemplary, the polysilicon layer 502 isremoved from the substrate 102 as illustrated in FIG. 6. The polysiliconlayer 502 may be removed by suitable wet or dry etching processes. Forexample, an etching solution such as, for example, NH₄OH, dilute-HF,and/or other suitable etchant may be used. Thereafter, a siliconcontaining layer 702 is formed on the substrate 102. The layer 702 maybe amorphous silicon (a-Si). The layer 702 may be formed by PECVD and/orother suitable processes. The thickness T1 of the layer 702 may be lessthan approximately half of the space S1 between the fins.

In another embodiment, the target layer is prepared by removing aportion of the polysilicon layer, described above with reference toblock 206, such that a portion of the polysilicon layer remains on thesubstrate. An additional layer including silicon may then be formed onthe etched polysilicon layer. Using FIGS. 12-13 as exemplary, thepolysilicon layer 502 is etched to form the etched polysilicon layer1202 as illustrated in FIG. 12. The polysilicon layer may be etched bysuitable wet or dry etching processes. For example, an etching solutionsuch as, for example, NH₄OH, dilute-HF, and/or other suitable etchantmay be used. The etched polysilicon layer 1202 has a thickness T2. Thethickness T2 may be greater than approximately two-thirds of the heightH2, which is the height of the fin 104 above the isolation region 106.Thereafter, a silicon containing layer 1302 is formed on the substrate102, see FIG. 13. The layer 1302 may be amorphous silicon (a-Si). Thethickness T3 of the layer 1302 may be less than approximately half ofthe space S1 between the fins. In an embodiment, the space S1 is betweenapproximately 2 nm and 10 nm. The silicon containing layer 1302 may beformed directly on the polysilicon layer 1202.

In another embodiment, the target layer is prepared by removing aportion of the polysilicon layer, described above with reference toblock 206, such that a portion of the polysilicon layer remains on thesubstrate. The remaining polysilicon layer is used as the target layer.In an embodiment, no additional silicon containing layer is included inthe target layer that is transformed to silicide. Using FIG. 16 asexemplary, the polysilicon layer 502 is etched to form the etchedpolysilicon layer 1602. The polysilicon layer may be etched by suitablewet or dry etching processes. For example, an etching solution such as,for example, NH₄OH, dilute-HF, and/or other suitable etchant may beused. The etched polysilicon layer 1602 has a thickness T3. Thethickness T3 may be greater than the height H3, which is the height ofthe fin 104 above the isolation region 106. In other words, the topsurface of the etched polysilicon layer 1602 lies above the top surfaceof the fin 104.

The method 200 then proceeds to block 212 where the siliciding of thetarget layer(s), described in block 210, is provided. The targetlayer(s) described above with reference to block 210 may be fullysilicided (e.g., all the silicon consumed to provide silicide). In anembodiment, an amorphous-silicon target layer is transformed tosilicide. In another embodiment, an amorphous-silicon layer and anunderlying polysilicon layer are transformed to silicide. In anembodiment, a remaining polysilicon layer is transformed to silicide.Each of these embodiments is discussed below with reference to FIGS. 8,9, FIG. 14, and FIG. 17.

In an embodiment, the silicide layer is formed by a process thatincludes depositing a metal layer, such as nickel, and annealing themetal layer such that the metal layer is able to react with target layerincluding silicon to form a silicide layer. The metal layer may bedeposited using conventional processes such as physical vapor deposition(PVD) (sputtering), chemical vapor deposition (CVD), plasma-enhancedchemical vapor deposition (PECVD), atmospheric pressure chemical vapordeposition (APCVD), low-pressure CVD (LPCVD), high density plasma CVD(HDPCVD), or atomic layer CVD (ALCVD). The annealing may use a rapidthermal anneal (RTA) in a gas atmosphere such as Ar, He, N₂, or otherinert gas. A second annealing may be used to provide a stable silicidelayer. The silicide materials may include nickel silicide (NiSi),nickel-platinum silicide (NiPtSi), nickel-platinum-germanium silicide(NiPtGeSi), nickel-germanium silicide (NiGeSi), ytterbium silicide(YbSi), platinum silicide (PtSi), iridium silicide (IrSi), erbiumsilicide (ErSi), cobalt silicide (CoSi), other suitable conductivematerials, and/or combinations thereof. The silicide layer may be fullysilicided.

Referring to the example of FIG. 8, the layer 702 (of FIG. 7) has beenfully silicided to form silicide layer 802. FIG. 8 illustrates anembodiment having a gap G between the fins 104. In another embodiment,FIG. 9 illustrates the layer 702 is fully silicided such that a silicidelayer 902 is formed. The silicide layer 902 fills the region between thefins 104, leaving no gap. The embodiments of FIGS. 8 and 9 may bedetermined by the thickness of the layer 702 and/or silicidationconditions.

Referring to the example of FIG. 14, the layer 1302 (e.g., a-Si) and theetched polysilicon layer 1202 (of FIG. 12) have been (both) fullysilicided to form silicide layer 1402. FIG. 14 illustrates an embodimenthaving a gap G2 between the fins 104. However, in other embodiments, thesilicide layer 1402 may fill the region between the fins 104, thusleaving no gap. The silicide layer 1402 has a thickness T1. Thethickness T1 may be greater than the fin height H2. The silicide layer1402 top surface may lie above the top surface of the fin 104.

Referring to the example of FIG. 17, the etched polysilicon layer 1602(of FIG. 16) has been fully silicided to form silicide layer 1702. Thesilicide layer 1702 has a thickness T4. The thickness T4 may be greaterthan the fin height H3. The silicide layer 1702 top surface may lieabove the top surface of the fin 104. Thus, the silicide layer 1702 canprotect the work function layer 404 disposed on the sidewalls of the fin104 during subsequent processes.

After the silicide layer is formed as described in various embodimentsabove, any remaining non-reacted metal layer may be removed from thesubstrate. In an embodiment, the non-reacted nickel is removed from thesubstrate. In an embodiment, material overlying the hard mask formed onthe fin may also be removed. Referring to the example of FIG. 18, thework function metal 404 has been removed from the top surface of thehard mask layer 302 (see FIG. 17).

The method 200 then proceeds to block 214 where a fill metal layer isformed on the substrate. The fill metal layer may be formed on thesilicide layer formed as described above with reference to block 212.The fill metal layer may serve to “fill” the remaining portions of thegate structure such that a contact can be formed. In an embodiment, thefill metal fills in the remaining portion of the trenches or openingsformed by the removal of the dummy gate structure in a replacement gateprocess. The fill metal layer may include Al, W, or Cu and/or othersuitable materials. The fill metal may be formed by CVD, PVD, plating,and/or other suitable processes.

Referring to the example of FIG. 10, a fill metal layer 1002 is disposedon the silicide layer 802. FIG. 10 illustrates the embodiment of FIG. 8after fill metal layer 1002 deposition. Referring to the example of FIG.11, a fill metal layer 1102 is disposed on the silicide layer 902. FIG.11 illustrates the embodiment of FIG. 9 after fill metal layer 1102deposition.

Referring to the example of FIG. 15, a fill metal layer 1502 is disposedon the silicide layer 1402. FIG. 15 illustrates the embodiment of FIG.14 after fill metal layer 1502 deposition.

Referring to the example of FIG. 19, a fill metal layer 1902 is disposedon the silicide layer 1702. FIG. 19 illustrates the embodiment of FIGS.18-19 after fill metal layer 1902 deposition.

The method 200 may continue to include further CMOS or MOS technologyprocessing to form various features known in the art. Exemplaryprocesses that may be performed include the formation of contactfeatures coupled to the gate structure including fill metal layer, and amulti-layer interconnect (MLI) having via and interconnect lines thatmay interconnect one or more semiconductor devices formed on thesubstrate.

Thus, it will be appreciated that provided are devices and methods offabricating devices that provide for a silicide layer to be formed onthe sidewalls of a fin. The fin may include the channel of asemiconductor device, such as a finFET. The silicide layer may benefitthe device by providing a stress onto the fin, thereby inducing a strainin the channel region of the device. The finFET may be a dual-gatefinFET device having a hard mask layer disposed on the top surface ofthe fin. It is understood that different embodiments disclosed hereinoffer different disclosure, and that they may make various changes,substitutions and alterations herein without departing from the spiritand scope of the present disclosure.

In one embodiment, a semiconductor device is described that includes asubstrate having a fin with a top surface and a first and second lateralsidewall. A hard mask layer is formed on the top surface of the fin. Agate dielectric layer is formed on the first and second lateralsidewalls of the fin. A work function metal layer formed on the gatedielectric layer on the first and the second lateral sidewalls of thefin. A silicide layer is formed on the work function metal layer on thefirst and the second lateral sidewalls of the fin.

Also described is a method of semiconductor fabrication includingproviding a semiconductor substrate having a first fin and a second finand forming a hard mask layer on a top surface of the first fin and thesecond fin. A work function metal layer is also formed on the first andsecond fin. Thereafter, at least one layer including silicon on the workfunction metal layer. A silicide process is performed on the at leastone layer including silicon thus forming a silicide layer.

In yet another embodiment, a fin-type field effect transistor (finFET)device is provided. The device includes a first fin and a second fin andan isolation structure interposing the first and second fin. A firstgate structure interfaces the sidewalls of the first fin. A second gatestructure interfaces the sidewalls of the second fin. The first gatestructure and the second gate structure each include a fully-silicidedlayer. The fully-silicided layer provides a stress to a channel regionof the first fin and the second fin.

In a further embodiment, the finFET device may include a hard mask layerformed on a top surface of the first gate structure and the second gatestructure. The finFET may be a dual-gate device (e.g., defining achannel by contacting two sides (e.g., lateral sidewalls) of the fin).The fully-silicided layer may interpose a work function layer and a fillmetal layer in the gate structure.

What is claimed is:
 1. A method of semiconductor fabrication,comprising: providing a semiconductor substrate having a first fin and asecond fin; forming a work function metal layer on at least one of thefirst fin and the second fin; forming a layer including silicon on thework function metal layer and on the first and second fins wherein theforming the layer including silicon includes: forming a polysiliconlayer; etching the polysilicon layer thereby removing it from on thework function metal layer, and forming an amorphous silicon layer on thework function layer after the etching the polysilicon layer; performinga silicide process on the layer including silicon including transformingthe amorphous silicon layer to a silicide layer, wherein the silicidelayer is disposed on sidewalls of the first and second fins; and forminga fill metal layer on the first and second fins and on the silicidelayer.
 2. The method of claim 1, wherein the silicide layer is notformed on a top surface of the first and second fins.
 3. The method ofclaim 1, further comprising, forming an isolation region between thefirst and second fins.
 4. A method of fabricating a fin-type fieldeffect transistor (finFET) device, comprising: providing a first fin anda second fin extending from a substrate; forming a first gate structureinterfacing the sidewalls of the first fin; forming a second gatestructure interfacing the sidewalls of the second fin; and wherein theforming the first gate structure and the second gate structure eachinclude: forming a silicide layer of the first gate structure and thesecond gate structure, and wherein the silicide layer provides a stressto a channel region of the first fin and the second fin, wherein theforming the silicide layer includes one of a first silicidation processor a second silicidation process: wherein the first silicidation processincludes: forming a polysilicon layer in the first and second gatestructures; removing the formed polysilicon layer from the first andsecond gate structures; and after the removing, forming a target layerincluding silicon in the first and second gate structures, and whereinthe forming the silicide layer includes performing a silicidationprocess on the target layer; and wherein the second silicidation processincludes: forming a layer that includes silicon on the substrate;partially etching the layer that includes silicon to form a targetlayer; and performing a silicidation process on the target layer to formthe silicide layer; and after forming the silicide layer, forming a fillmetal layer on the formed silicide layer; forming a contact featurecoupled to each of the first gate structure including the fill metallayer and the second gate structure including the fill metal layer. 5.The method of claim 4, wherein the forming the fill metal layer providesa bottom surface of the fill metal layer that is above a top surface ofthe first fin.
 6. The method of fabricating the finFET device of claim4, wherein the first gate structure and the second gate structure arespaced a region apart, and wherein the forming the silicide layerincludes filling the region between the first and second gate structuresuch that a bottom surface of the fill metal layer is disposed above atop surface of the first and second fins.
 7. The method of fabricatingthe finFET device of claim 4, wherein the forming the silicide layerincludes: the first silicidation process and not the second silicidationprocess.
 8. The method of fabricating the finFET device of claim 4,wherein the forming the silicide layer includes: the second silicidationprocess and not the first silicidation process.
 9. The method offabricating the finFET device of claim 8, wherein the forming thesilicide layer further includes: forming a second layer includingsilicon on the at least partially etched layer including silicon, andwherein the performing the silicidation process also silicides thesecond layer.
 10. A method of fabricating a device, comprising:providing a substrate including a first fin and a second fin that isadjacent to the first fin, wherein each of the first fin and the secondfin include a top surface and a first and second lateral sidewall;forming a gate dielectric layer on the first and the second lateralsidewall of the first fin and on the first and second lateral sidewallof the second fin; forming a metal layer on the gate dielectric layer;forming a polysilicon layer on the metal layer; wherein the metal layerand the polysilicon layer provide a first gate structure on the firstfin and the second fin; after the providing the first gate structure, atleast partially etching the polysilicon layer of the first gatestructure; after the at least partially etching, forming a silicidelayer on the metal layer in the first gate structure; and forming a fillmetal layer on the silicide layer.
 11. The method of claim 10, furthercomprising: removing the metal layer from a top surface of the first finand the second fin after the performing the silicide process.
 12. Themethod of claim 10, wherein the fill metal layer is formed on the topsurface of the first fin and on the top surface of the second fin. 13.The method of claim 10, wherein the metal layer is one of a p-type workfunction metal and an n-type work function metal.
 14. The method ofclaim 10, wherein the silicide layer is not formed on the top surface ofthe first fin, wherein the silicide layer is not formed on the topsurface of the second fin.
 15. The method of claim 10, wherein theforming the silicide layer on the metal layer_includes completelyetching the polysilicon layer to remove the polysilicon layer from thefirst gate structure and after the removal, forming another layerincluding silicon on the metal layer in the first gate structure andsiliciding the another layer including silicon.
 16. The method of claim10, wherein the forming the silicide layer on the metal layer includespartially etching the polysilicon layer such that a first portion of thepolysilicon layer is disposed in the first gate structure and whereinthe forming the silicide layer includes siliciding the first portion ofthe polysilicon layer.
 17. The method of claim 16, wherein an amorphoussilicon layer is disposed on the first portion of the polysilicon layerprior to the siliciding.